TY - GEN
T1 - Sputter deposited ZnO porous films for sensing applications
AU - Borysiewicz, Michał A.
AU - Dynowska, Elzbieta
AU - Kolkovsky, Valery
AU - Wielgus, Maciej
AU - Gołaszewska, Krystyna
AU - Kamińska, Eliana
AU - Ekielski, Marek
AU - Struk, Przemysław
AU - Pustelny, Tadeusz
AU - Piotrowska, Anna
PY - 2013
Y1 - 2013
N2 - Nanoporous ZnO films are fabricated using a two step approach: sputter deposition of porous Zn followed by an ex-situ annealing in an oxygen flow at 400°C. The created structures have a porosity of 34% enabling use in surface-based absorption sensors. The films are used in a resistance-based sensor allowing easy discrimination between liquid methanol and ethanol by resistance measurements and also in a transmission-based sensor to detect NO2, NH3 and H2 gases in concentration as low as 500 ppm.
AB - Nanoporous ZnO films are fabricated using a two step approach: sputter deposition of porous Zn followed by an ex-situ annealing in an oxygen flow at 400°C. The created structures have a porosity of 34% enabling use in surface-based absorption sensors. The films are used in a resistance-based sensor allowing easy discrimination between liquid methanol and ethanol by resistance measurements and also in a transmission-based sensor to detect NO2, NH3 and H2 gases in concentration as low as 500 ppm.
UR - https://www.scopus.com/pages/publications/84889264620
U2 - 10.1557/opl.2013.34
DO - 10.1557/opl.2013.34
M3 - Conference contribution
AN - SCOPUS:84889264620
SN - 9781605114712
T3 - Materials Research Society Symposium Proceedings
SP - 71
EP - 76
BT - Oxide Semiconductors and Thin Films
T2 - 2012 MRS Fall Meeting
Y2 - 25 November 2012 through 30 November 2012
ER -