Abstrakt
Rib waveguides were fabricated with the use of selective, wet chemical etching of two-component waveguide films SiO2:TiO2 which were obtained using sol-gel method. Photoresist was applied as a mask in the process. The etching of the films SiO2:TiO2 was carried out in water solution of ammonia fluoride. The paper presents the results of theoretical analysis as well as the power distributions in the fabricated strip waveguides.
| Język oryginału | angielski |
|---|---|
| Strony (od–do) | 1168-1170 |
| Liczba stron | 3 |
| Czasopismo | Acta Physica Polonica A |
| Tom | 118 |
| Numer wydania | 6 |
| Identyfikatory DOI | |
| Status publikacji | Opublikowano - 1 gru 2010 |
Obszary tematyczne ASJC Scopus
- Ogólna fizyka i astronomia
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