Rib waveguides fabricated by means of chemical etching of sol-gel SiO 2:TiO 2 films

P. Karasiński; R. Rogoziński

doi:10.1016/j.optcom.2004.10.074

Rib waveguides fabricated by means of chemical etching of sol-gel SiO ₂:TiO ₂ films

P. Karasiński
, R. Rogoziński

Katedra Optoelektroniki (RE/RE4)

Silesian University of Technology

Wyniki badań: Wkład do czasopisma › Artykuł › recenzja

24 Cytowania z bazy Scopus

Abstrakt

The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO ₂:TiO ₂ were produced using the sol-gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH ₄F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.

Język oryginału	angielski
Strony (od–do)	237-242
Liczba stron	6
Czasopismo	Optics Communications
Tom	245
Numer wydania	1-6
Identyfikatory DOI	https://doi.org/10.1016/j.optcom.2004.10.074
Status publikacji	Opublikowano - 17 sty 2005

Obszary tematyczne ASJC Scopus

Materiały elektroniczne, optyczne i magnetyczne
Fizyka atomowa i molekularna oraz optyka
Chemia fizyczna i teoretyczna
Inżynieria elektryczna i elektroniczna

Uzyskaj dostęp do dokumentu

10.1016/j.optcom.2004.10.074

Inne pliki i linki

Link do publikacji w Scopus

Cytowanie

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title = "Rib waveguides fabricated by means of chemical etching of sol-gel SiO 2:TiO 2 films",

abstract = "The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO 2:TiO 2 were produced using the sol-gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH 4F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.",

keywords = "Chemical etching, Optical planar waveguide, Rib waveguide, Sol-gel",

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AU - Rogoziński, R.

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N2 - The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO 2:TiO 2 were produced using the sol-gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH 4F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.

AB - The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO 2:TiO 2 were produced using the sol-gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH 4F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.

KW - Chemical etching

KW - Optical planar waveguide

KW - Rib waveguide

KW - Sol-gel

UR - https://www.scopus.com/pages/publications/11444259715

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