Photoemission yield study of the Fermi level position of the copper phthalocyanine thin films

J. Szuber; L. Grzadziel; A. Krol

Photoemission yield study of the Fermi level position of the copper phthalocyanine thin films

J. Szuber
, L. Grzadziel
, A. Krol

Wyniki badań: Wkład do czasopisma › Artykuł z konferencji › recenzja

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Abstrakt

Photoemission yield spectroscopy (PYS) has been used in studies of the interface Fermi level position of the UHV annealed copper phthalocyanine (CuPc) thin films exposed to oxygen. Its variation, depending on oxygen exposure, is analyzed. Moreover the possible origin of the effective density of filled electronic states localized in the band gap below the Fermi level E_F and in the upper part of the valence band is briefly discussed.

Język oryginału	angielski
Strony (od–do)	326-328
Liczba stron	3
Czasopismo	Electron Technology (Warsaw)
Tom	29
Numer wydania	2-3
Status publikacji	Opublikowano - 1996
Wydarzenie	Proceedings of the 1995 3rd Seminar on Surface and Thin Film Structures - Spala, Pol Czas trwania: 23 paź 1995 → 26 paź 1995

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Cytowanie

@article{00bb25a14f3f4b4b84ad46643895a0e4,

title = "Photoemission yield study of the Fermi level position of the copper phthalocyanine thin films",

abstract = "Photoemission yield spectroscopy (PYS) has been used in studies of the interface Fermi level position of the UHV annealed copper phthalocyanine (CuPc) thin films exposed to oxygen. Its variation, depending on oxygen exposure, is analyzed. Moreover the possible origin of the effective density of filled electronic states localized in the band gap below the Fermi level EF and in the upper part of the valence band is briefly discussed.",

author = "J. Szuber and L. Grzadziel and A. Krol",

year = "1996",

language = "English",

volume = "29",

pages = "326--328",

journal = "Electron Technology (Warsaw)",

issn = "0070-9816",

publisher = "Institute of Electron Technology",

number = "2-3",

note = "Proceedings of the 1995 3rd Seminar on Surface and Thin Film Structures ; Conference date: 23-10-1995 Through 26-10-1995",

}

TY - JOUR

T1 - Photoemission yield study of the Fermi level position of the copper phthalocyanine thin films

AU - Szuber, J.

AU - Grzadziel, L.

AU - Krol, A.

PY - 1996

Y1 - 1996

N2 - Photoemission yield spectroscopy (PYS) has been used in studies of the interface Fermi level position of the UHV annealed copper phthalocyanine (CuPc) thin films exposed to oxygen. Its variation, depending on oxygen exposure, is analyzed. Moreover the possible origin of the effective density of filled electronic states localized in the band gap below the Fermi level EF and in the upper part of the valence band is briefly discussed.

AB - Photoemission yield spectroscopy (PYS) has been used in studies of the interface Fermi level position of the UHV annealed copper phthalocyanine (CuPc) thin films exposed to oxygen. Its variation, depending on oxygen exposure, is analyzed. Moreover the possible origin of the effective density of filled electronic states localized in the band gap below the Fermi level EF and in the upper part of the valence band is briefly discussed.

UR - https://www.scopus.com/pages/publications/0030397779

M3 - Conference article

AN - SCOPUS:0030397779

SN - 0070-9816

VL - 29

SP - 326

EP - 328

JO - Electron Technology (Warsaw)

JF - Electron Technology (Warsaw)

IS - 2-3

T2 - Proceedings of the 1995 3rd Seminar on Surface and Thin Film Structures

Y2 - 23 October 1995 through 26 October 1995

ER -

Photoemission yield study of the Fermi level position of the copper phthalocyanine thin films

Abstrakt

Obszary tematyczne ASJC Scopus

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