Conductive and resistive layers based on Ni-P alloy made by selective metallization

Piotr Kowalik; Edyta Wróbel

doi:10.15199/48.2023.08.34

Conductive and resistive layers based on Ni-P alloy made by selective metallization

Przetłumaczony tytuł wkładu: Warstwy przewodzące i rezystancyjne na bazie stopu Ni-P wykonane metodą selektywnej metalizacji

Katedra Elektroniki, Elektrotechniki i Mikroelektroniki (RAU/RAU11)

Wyniki badań: Wkład do czasopisma › Artykuł › recenzja

Abstrakt

The article presents the results of the authors work on the application of layers based on Ni-P alloy in electronics. The authors proved that these layers can be used to make conductive and resistive paths on ceramic and silicon substrates. The innovativeness of the work carried out is expressed in the combination of electroless metallization technology and photochemical technology for selective deposition of layers of any shape.

Przetłumaczony tytuł wkładu	Warstwy przewodzące i rezystancyjne na bazie stopu Ni-P wykonane metodą selektywnej metalizacji
Język oryginału	angielski
Strony (od–do)	188-191
Liczba stron	4
Czasopismo	Przeglad Elektrotechniczny
Tom	2023
Numer wydania	8
Identyfikatory DOI	https://doi.org/10.15199/48.2023.08.34
Status publikacji	Opublikowano - 2023

Obszary tematyczne ASJC Scopus

Inżynieria elektryczna i elektroniczna

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10.15199/48.2023.08.34

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Cytowanie

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title = "Conductive and resistive layers based on Ni-P alloy made by selective metallization",

abstract = "The article presents the results of the authors work on the application of layers based on Ni-P alloy in electronics. The authors proved that these layers can be used to make conductive and resistive paths on ceramic and silicon substrates. The innovativeness of the work carried out is expressed in the combination of electroless metallization technology and photochemical technology for selective deposition of layers of any shape.",

keywords = "Ni-P alloy, conductive layers, resistive layers, selective metallization",

author = "Piotr Kowalik and Edyta Wr{\'o}bel",

year = "2023",

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T1 - Conductive and resistive layers based on Ni-P alloy made by selective metallization

AU - Kowalik, Piotr

AU - Wróbel, Edyta

PY - 2023

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N2 - The article presents the results of the authors work on the application of layers based on Ni-P alloy in electronics. The authors proved that these layers can be used to make conductive and resistive paths on ceramic and silicon substrates. The innovativeness of the work carried out is expressed in the combination of electroless metallization technology and photochemical technology for selective deposition of layers of any shape.

AB - The article presents the results of the authors work on the application of layers based on Ni-P alloy in electronics. The authors proved that these layers can be used to make conductive and resistive paths on ceramic and silicon substrates. The innovativeness of the work carried out is expressed in the combination of electroless metallization technology and photochemical technology for selective deposition of layers of any shape.

KW - Ni-P alloy

KW - conductive layers

KW - resistive layers

KW - selective metallization

UR - https://www.scopus.com/pages/publications/85172367300

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DO - 10.15199/48.2023.08.34

M3 - Article

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Conductive and resistive layers based on Ni-P alloy made by selective metallization

Abstrakt

Obszary tematyczne ASJC Scopus

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