Abstrakt
In this paper a self-constructed unipolar mass filter is presented together with a new method to determine the partial pressures of gases with near atomic mass number desorbing from the surfaces during surface chemical reactions. It mainly uses the dependence of the efficiency of gas ionisation on the ionisation energy of electrons. Using the proposed procedure, the relative contents of methane and atomic oxygen observed during the cleaning of native oxide covered GaAs(100) surface by atomic hydrogen were estimated as 0.1 ± 0.02.
| Język oryginału | angielski |
|---|---|
| Strony (od–do) | 205-209 |
| Liczba stron | 5 |
| Czasopismo | Vacuum |
| Tom | 54 |
| Numer wydania | 1-4 |
| Identyfikatory DOI | |
| Status publikacji | Opublikowano - lip 1999 |
| Wydarzenie | Proceedings of the 1998 19th International Seminar on Surface Physics - Polanica-Zdroj, Pol Czas trwania: 15 cze 1998 → 19 cze 1998 |
Obszary tematyczne ASJC Scopus
- Instrumentacja
- Fizyka materii skondensowanej
- Powierzchnie, powłoki i filmy
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