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XPS analysis of surface chemistry of near surface region of epiready GaAs(1 0 0) surface treated with (NH 4 ) 2 S x solution

  • S. Arabasz
  • , E. Bergignat
  • , G. Hollinger
  • , J. Szuber
  • Silesian University of Technology
  • Lyon-UMR CNRS 5512

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)

Abstract

In this work we analyze the effect of (NH) 2 S x wet treatment on the GaAs(1 0 0) covered with "epiready" oxide layer without any pretreatment in order to check the removal of oxides and carbon-related contamination, and the formation of sulfur species. The sulfidation procedure consisted of epiready sample dipping (at room and 40 °C temperatures) in an ammonium polysulfide solution combined with a UHV flash annealing up to 500 °C. The inspection of the XPS As 2p 3/2 and Ga 2p 3/2 spectra taken at surface sensitive mode revealed: (i) the temperature-dependent reduction of the amount of GaAs oxides and carbon contamination after sulfidation, and almost their complete removal after subsequent annealing, (ii) the creation of sulfur bonds with both Ga and As, with more thermally stable Ga-S bonds, and (iii) the slight reduction in elemental arsenic amount.

Original languageEnglish
Pages (from-to)7659-7663
Number of pages5
JournalApplied Surface Science
Volume252
Issue number21
DOIs
Publication statusPublished - 31 Aug 2006

Keywords

  • GaAs
  • Passivation
  • Sulfidation
  • XPS

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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