Wytwarzanie stabilnych warstw rezystywnych metoda̧ bezpra̧dowej metalizacji

Zbigniew Pruszowski; Piotr Kowalik

Wytwarzanie stabilnych warstw rezystywnych metoda̧ bezpra̧dowej metalizacji

Translated title of the contribution: Technology of preparation of Ni-P resistive layers

Zbigniew Pruszowski
, Piotr Kowalik

Department of Electronics; Electrical Engineering and Microelectronics (RAU/RAU11)

Silesian University of Technology

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

In this paper is presented modified technology of preparation of Ni-P resistive layers. These layers are characterised by square resistance 0,5 - 10Ω, minimised TCR and best stability. In this paper are described change of resistance with changes of temperature.

Translated title of the contribution	Technology of preparation of Ni-P resistive layers
Original language	Polish
Pages (from-to)	276-278
Number of pages	3
Journal	Przeglad Elektrotechniczny
Volume	86
Issue number	6
Publication status	Published - Jun 2010

ASJC Scopus subject areas

Electrical and Electronic Engineering

Cite this

@article{0478017983164fc7a694a0d37f9a0e55,

title = "Wytwarzanie stabilnych warstw rezystywnych metod{\c a} bezpr{\c a}dowej metalizacji",

abstract = "In this paper is presented modified technology of preparation of Ni-P resistive layers. These layers are characterised by square resistance 0,5 - 10Ω, minimised TCR and best stability. In this paper are described change of resistance with changes of temperature.",

keywords = "Chemical metallisation, Electrical durability, Resistive layers, TCR",

author = "Zbigniew Pruszowski and Piotr Kowalik",

year = "2010",

month = jun,

language = "polski",

volume = "86",

pages = "276--278",

journal = "Przeglad Elektrotechniczny",

issn = "0033-2097",

publisher = "Wydawnictwo SIGMA-NOT",

number = "6",

}

TY - JOUR

T1 - Wytwarzanie stabilnych warstw rezystywnych metoda̧ bezpra̧dowej metalizacji

AU - Pruszowski, Zbigniew

AU - Kowalik, Piotr

PY - 2010/6

Y1 - 2010/6

N2 - In this paper is presented modified technology of preparation of Ni-P resistive layers. These layers are characterised by square resistance 0,5 - 10Ω, minimised TCR and best stability. In this paper are described change of resistance with changes of temperature.

AB - In this paper is presented modified technology of preparation of Ni-P resistive layers. These layers are characterised by square resistance 0,5 - 10Ω, minimised TCR and best stability. In this paper are described change of resistance with changes of temperature.

KW - Chemical metallisation

KW - Electrical durability

KW - Resistive layers

KW - TCR

UR - https://www.scopus.com/pages/publications/77953249344

M3 - Artykuł

AN - SCOPUS:77953249344

SN - 0033-2097

VL - 86

SP - 276

EP - 278

JO - Przeglad Elektrotechniczny

JF - Przeglad Elektrotechniczny

IS - 6

ER -

Wytwarzanie stabilnych warstw rezystywnych metoda̧ bezpra̧dowej metalizacji

Abstract

ASJC Scopus subject areas

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