Sputter deposited ZnO porous films for sensing applications

Michał A. Borysiewicz; Elzbieta Dynowska; Valery Kolkovsky; Maciej Wielgus; Krystyna Gołaszewska; Eliana Kamińska; Marek Ekielski; Przemysław Struk; Tadeusz Pustelny; Anna Piotrowska

doi:10.1557/opl.2013.34

Sputter deposited ZnO porous films for sensing applications

Michał A. Borysiewicz
, Elzbieta Dynowska
, Valery Kolkovsky
, Maciej Wielgus
, Krystyna Gołaszewska
, Eliana Kamińska
, Marek Ekielski
, Przemysław Struk
, Tadeusz Pustelny
, Anna Piotrowska

Department of Optoelectronics (RE/RE4)

Institute of Microelectronics and Photonics
Institute of Physics of the Polish Academy of Sciences
Warsaw University of Technology
Silesian University of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

6 Citations (Scopus)

Abstract

Nanoporous ZnO films are fabricated using a two step approach: sputter deposition of porous Zn followed by an ex-situ annealing in an oxygen flow at 400°C. The created structures have a porosity of 34% enabling use in surface-based absorption sensors. The films are used in a resistance-based sensor allowing easy discrimination between liquid methanol and ethanol by resistance measurements and also in a transmission-based sensor to detect NO₂, NH₃ and H₂ gases in concentration as low as 500 ppm.

Original language	English
Title of host publication	Oxide Semiconductors and Thin Films
Pages	71-76
Number of pages	6
DOIs	https://doi.org/10.1557/opl.2013.34
Publication status	Published - 2013
Event	2012 MRS Fall Meeting - Boston, MA, United States Duration: 25 Nov 2012 → 30 Nov 2012

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	1494
ISSN (Print)	0272-9172

Conference

Conference	2012 MRS Fall Meeting
Country/Territory	United States
City	Boston, MA
Period	25/11/12 → 30/11/12

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/opl.2013.34

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Borysiewicz, M. A., Dynowska, E., Kolkovsky, V., Wielgus, M., Gołaszewska, K., Kamińska, E., Ekielski, M., Struk, P., Pustelny, T., & Piotrowska, A. (2013). Sputter deposited ZnO porous films for sensing applications. In Oxide Semiconductors and Thin Films (pp. 71-76). (Materials Research Society Symposium Proceedings; Vol. 1494). https://doi.org/10.1557/opl.2013.34

@inproceedings{f73c28da229545dd9f57a8385ea1f9b8,

title = "Sputter deposited ZnO porous films for sensing applications",

abstract = "Nanoporous ZnO films are fabricated using a two step approach: sputter deposition of porous Zn followed by an ex-situ annealing in an oxygen flow at 400°C. The created structures have a porosity of 34\% enabling use in surface-based absorption sensors. The films are used in a resistance-based sensor allowing easy discrimination between liquid methanol and ethanol by resistance measurements and also in a transmission-based sensor to detect NO2, NH3 and H2 gases in concentration as low as 500 ppm.",

author = "Borysiewicz, \{Micha{\l} A.\} and Elzbieta Dynowska and Valery Kolkovsky and Maciej Wielgus and Krystyna Go{\l}aszewska and Eliana Kami{\'n}ska and Marek Ekielski and Przemys{\l}aw Struk and Tadeusz Pustelny and Anna Piotrowska",

year = "2013",

doi = "10.1557/opl.2013.34",

language = "English",

isbn = "9781605114712",

series = "Materials Research Society Symposium Proceedings",

pages = "71--76",

booktitle = "Oxide Semiconductors and Thin Films",

note = "2012 MRS Fall Meeting ; Conference date: 25-11-2012 Through 30-11-2012",

}

Borysiewicz, MA, Dynowska, E, Kolkovsky, V, Wielgus, M, Gołaszewska, K, Kamińska, E, Ekielski, M, Struk, P, Pustelny, T & Piotrowska, A 2013, Sputter deposited ZnO porous films for sensing applications. in Oxide Semiconductors and Thin Films. Materials Research Society Symposium Proceedings, vol. 1494, pp. 71-76, 2012 MRS Fall Meeting, Boston, MA, United States, 25/11/12. https://doi.org/10.1557/opl.2013.34

TY - GEN

T1 - Sputter deposited ZnO porous films for sensing applications

AU - Borysiewicz, Michał A.

AU - Dynowska, Elzbieta

AU - Kolkovsky, Valery

AU - Wielgus, Maciej

AU - Gołaszewska, Krystyna

AU - Kamińska, Eliana

AU - Ekielski, Marek

AU - Struk, Przemysław

AU - Pustelny, Tadeusz

AU - Piotrowska, Anna

PY - 2013

Y1 - 2013

N2 - Nanoporous ZnO films are fabricated using a two step approach: sputter deposition of porous Zn followed by an ex-situ annealing in an oxygen flow at 400°C. The created structures have a porosity of 34% enabling use in surface-based absorption sensors. The films are used in a resistance-based sensor allowing easy discrimination between liquid methanol and ethanol by resistance measurements and also in a transmission-based sensor to detect NO2, NH3 and H2 gases in concentration as low as 500 ppm.

AB - Nanoporous ZnO films are fabricated using a two step approach: sputter deposition of porous Zn followed by an ex-situ annealing in an oxygen flow at 400°C. The created structures have a porosity of 34% enabling use in surface-based absorption sensors. The films are used in a resistance-based sensor allowing easy discrimination between liquid methanol and ethanol by resistance measurements and also in a transmission-based sensor to detect NO2, NH3 and H2 gases in concentration as low as 500 ppm.

UR - https://www.scopus.com/pages/publications/84889264620

U2 - 10.1557/opl.2013.34

DO - 10.1557/opl.2013.34

M3 - Conference contribution

AN - SCOPUS:84889264620

SN - 9781605114712

T3 - Materials Research Society Symposium Proceedings

SP - 71

EP - 76

BT - Oxide Semiconductors and Thin Films

T2 - 2012 MRS Fall Meeting

Y2 - 25 November 2012 through 30 November 2012

ER -

Sputter deposited ZnO porous films for sensing applications

Abstract

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Conference

ASJC Scopus subject areas

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