Silica layers as masks in Ag+-Na+ ion exchange processes

R. Rogoziński; C. Tyszkiewicz; P. Karasiński; M. Żelechower; J. Szala

doi:10.1016/j.tsf.2016.06.043

Silica layers as masks in Ag⁺-Na⁺ ion exchange processes

R. Rogoziński
, C. Tyszkiewicz
, P. Karasiński
, M. Żelechower
, J. Szala

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

The paper present the application of sol-gel derived silica layers as masks in selective ion exchange processes. These layers were deposited on soda-lime glass substrates, subjected then to the ion exchange processes using liquid source of admixture in the form of a AgNO₃:NaNO₃ solution with a molar fraction of silver κ_Ag = 0.0025. The concentration of silver in the masked and non-masked areas of the glass were examined with the use of Scanning Electron Microscope/Energy-Dispersive X-ray Spectroscopy (SEM/EDS). The resulting silver concentration profiles allowed to estimate the masking properties of silica layers. Using sol-gel silica films as masks for selective ion-exchange processes, the multimode strip waveguides were produced.

Original language	English
Pages (from-to)	122-127
Number of pages	6
Journal	Thin Solid Films
Volume	615
DOIs	https://doi.org/10.1016/j.tsf.2016.06.043
Publication status	Published - 30 Sept 2016

Keywords

Channel waveguides
Ion-exchange
Silica films
Sol-gel

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2016.06.043

Cite this

@article{1b7657be729041db8b1420f0dc6f28bb,

title = "Silica layers as masks in Ag+-Na+ ion exchange processes",

abstract = "The paper present the application of sol-gel derived silica layers as masks in selective ion exchange processes. These layers were deposited on soda-lime glass substrates, subjected then to the ion exchange processes using liquid source of admixture in the form of a AgNO3:NaNO3 solution with a molar fraction of silver κAg = 0.0025. The concentration of silver in the masked and non-masked areas of the glass were examined with the use of Scanning Electron Microscope/Energy-Dispersive X-ray Spectroscopy (SEM/EDS). The resulting silver concentration profiles allowed to estimate the masking properties of silica layers. Using sol-gel silica films as masks for selective ion-exchange processes, the multimode strip waveguides were produced.",

keywords = "Channel waveguides, Ion-exchange, Silica films, Sol-gel",

author = "R. Rogozi{\'n}ski and C. Tyszkiewicz and P. Karasi{\'n}ski and M. {\.Z}elechower and J. Szala",

note = "Publisher Copyright: {\textcopyright} 2016 Elsevier B.V.",

year = "2016",

month = sep,

day = "30",

doi = "10.1016/j.tsf.2016.06.043",

language = "English",

volume = "615",

pages = "122--127",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Silica layers as masks in Ag+-Na+ ion exchange processes

AU - Rogoziński, R.

AU - Tyszkiewicz, C.

AU - Karasiński, P.

AU - Żelechower, M.

AU - Szala, J.

PY - 2016/9/30

Y1 - 2016/9/30

N2 - The paper present the application of sol-gel derived silica layers as masks in selective ion exchange processes. These layers were deposited on soda-lime glass substrates, subjected then to the ion exchange processes using liquid source of admixture in the form of a AgNO3:NaNO3 solution with a molar fraction of silver κAg = 0.0025. The concentration of silver in the masked and non-masked areas of the glass were examined with the use of Scanning Electron Microscope/Energy-Dispersive X-ray Spectroscopy (SEM/EDS). The resulting silver concentration profiles allowed to estimate the masking properties of silica layers. Using sol-gel silica films as masks for selective ion-exchange processes, the multimode strip waveguides were produced.

AB - The paper present the application of sol-gel derived silica layers as masks in selective ion exchange processes. These layers were deposited on soda-lime glass substrates, subjected then to the ion exchange processes using liquid source of admixture in the form of a AgNO3:NaNO3 solution with a molar fraction of silver κAg = 0.0025. The concentration of silver in the masked and non-masked areas of the glass were examined with the use of Scanning Electron Microscope/Energy-Dispersive X-ray Spectroscopy (SEM/EDS). The resulting silver concentration profiles allowed to estimate the masking properties of silica layers. Using sol-gel silica films as masks for selective ion-exchange processes, the multimode strip waveguides were produced.

KW - Channel waveguides

KW - Ion-exchange

KW - Silica films

KW - Sol-gel

UR - https://www.scopus.com/pages/publications/84990051105

U2 - 10.1016/j.tsf.2016.06.043

DO - 10.1016/j.tsf.2016.06.043

M3 - Article

AN - SCOPUS:84990051105

SN - 0040-6090

VL - 615

SP - 122

EP - 127

JO - Thin Solid Films

JF - Thin Solid Films

ER -