Rib waveguides fabricated by means of chemical etching of sol-gel SiO 2:TiO 2 films

P. Karasiński; R. Rogoziński

doi:10.1016/j.optcom.2004.10.074

Rib waveguides fabricated by means of chemical etching of sol-gel SiO ₂:TiO ₂ films

P. Karasiński
, R. Rogoziński

Department of Optoelectronics (RE/RE4)

Silesian University of Technology

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Abstract

The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO ₂:TiO ₂ were produced using the sol-gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH ₄F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.

Original language	English
Pages (from-to)	237-242
Number of pages	6
Journal	Optics Communications
Volume	245
Issue number	1-6
DOIs	https://doi.org/10.1016/j.optcom.2004.10.074
Publication status	Published - 17 Jan 2005

Keywords

Chemical etching
Optical planar waveguide
Rib waveguide
Sol-gel

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Physical and Theoretical Chemistry
Electrical and Electronic Engineering

Access to Document

10.1016/j.optcom.2004.10.074

Cite this

@article{db6578098e204fb5892183e8f8074785,

title = "Rib waveguides fabricated by means of chemical etching of sol-gel SiO 2:TiO 2 films",

abstract = "The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO 2:TiO 2 were produced using the sol-gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH 4F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.",

keywords = "Chemical etching, Optical planar waveguide, Rib waveguide, Sol-gel",

author = "P. Karasi{\'n}ski and R. Rogozi{\'n}ski",

year = "2005",

month = jan,

day = "17",

doi = "10.1016/j.optcom.2004.10.074",

language = "English",

volume = "245",

pages = "237--242",

journal = "Optics Communications",

issn = "0030-4018",

publisher = "Elsevier B.V.",

number = "1-6",

}

TY - JOUR

T1 - Rib waveguides fabricated by means of chemical etching of sol-gel SiO 2:TiO 2 films

AU - Karasiński, P.

AU - Rogoziński, R.

PY - 2005/1/17

Y1 - 2005/1/17

N2 - The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO 2:TiO 2 were produced using the sol-gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH 4F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.

AB - The paper involves the fabrication of channel rib waveguides with the use of selective chemical etching of dielectric waveguide films. The two-component dielectric waveguide films SiO 2:TiO 2 were produced using the sol-gel method. A photoresist was applied as a mask in the etching process. The solution of ammonia fluoride NH 4F was applied in the processes of chemical etching. The paper presents the determined technological characteristics and the obtained channel rib waveguides.

KW - Chemical etching

KW - Optical planar waveguide

KW - Rib waveguide

KW - Sol-gel

UR - https://www.scopus.com/pages/publications/11444259715

U2 - 10.1016/j.optcom.2004.10.074

DO - 10.1016/j.optcom.2004.10.074

M3 - Article

AN - SCOPUS:11444259715

SN - 0030-4018

VL - 245

SP - 237

EP - 242

JO - Optics Communications

JF - Optics Communications

IS - 1-6

ER -