Rezystywne warstwy Ni-W-P wytwarzane methodical chemicznej metalizacji

Piotr Kowalik; Zbigniew Pruszowski

doi:10.15199/48.2015.09.27

Rezystywne warstwy Ni-W-P wytwarzane methodical chemicznej metalizacji

Translated title of the contribution: Resistive ni-w-p layers obtained by chemical metallization method

Piotr Kowalik
, Zbigniew Pruszowski

Department of Electronics; Electrical Engineering and Microelectronics (RAU/RAU11)

Silesian University of Technology

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

The paper describes a new method of obtaining of Ni-W-P resistor layers, featuring elevated electrical stability.

Translated title of the contribution	Resistive ni-w-p layers obtained by chemical metallization method
Original language	Polish
Pages (from-to)	105-106
Number of pages	2
Journal	Przeglad Elektrotechniczny
Volume	91
Issue number	9
DOIs	https://doi.org/10.15199/48.2015.09.27
Publication status	Published - 1 Aug 2015

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.15199/48.2015.09.27

Cite this

@article{7c468c24b2114a2a999a894873af0dbe,

title = "Rezystywne warstwy Ni-W-P wytwarzane methodical chemicznej metalizacji",

abstract = "The paper describes a new method of obtaining of Ni-W-P resistor layers, featuring elevated electrical stability.",

keywords = "Chemical metallization, Ni-P, Ni-W-P, Precision resistors, Resistive layers",

author = "Piotr Kowalik and Zbigniew Pruszowski",

year = "2015",

month = aug,

day = "1",

doi = "10.15199/48.2015.09.27",

language = "polski",

volume = "91",

pages = "105--106",

journal = "Przeglad Elektrotechniczny",

issn = "0033-2097",

publisher = "Wydawnictwo SIGMA-NOT",

number = "9",

}

TY - JOUR

T1 - Rezystywne warstwy Ni-W-P wytwarzane methodical chemicznej metalizacji

AU - Kowalik, Piotr

AU - Pruszowski, Zbigniew

PY - 2015/8/1

Y1 - 2015/8/1

N2 - The paper describes a new method of obtaining of Ni-W-P resistor layers, featuring elevated electrical stability.

AB - The paper describes a new method of obtaining of Ni-W-P resistor layers, featuring elevated electrical stability.

KW - Chemical metallization

KW - Ni-P

KW - Ni-W-P

KW - Precision resistors

KW - Resistive layers

UR - https://www.scopus.com/pages/publications/84940195559

U2 - 10.15199/48.2015.09.27

DO - 10.15199/48.2015.09.27

M3 - Artykuł

AN - SCOPUS:84940195559

SN - 0033-2097

VL - 91

SP - 105

EP - 106

JO - Przeglad Elektrotechniczny

JF - Przeglad Elektrotechniczny

IS - 9

ER -

Rezystywne warstwy Ni-W-P wytwarzane methodical chemicznej metalizacji

Abstract

UN SDGs

ASJC Scopus subject areas

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