Jedno- i dwuwarstwowe struktury antyrefleksyjne wytwarzane metodą zol-żel do zastosowań w fotoogniwach krzemowych

Besides many different types of photovoltaic solar cells, silicon solar cells are still of significant importance. Bare silica’s high refraction index leads to greater than 34% reflection of solar light photones, within silica’s absorption band, from its surface without generating excitons. Reflection loss can be significantly reduced with the use of surface texturing and/or antireflective coatings. The most beneficial effect is achieved when combinig both, surface texturing and antireflective coatings. This work presents single and double layer Anti Reflective Structures (ARS’s) derived from sol-gel process for application in silicon photovoltaic cells. Weighted average reflection of a single layer ARS is R_w~9%, whereas double layer ARS provides weighted average reflection R_w<4%. In this work theoretical optimization of ARS’s, technological process of structure fabrication as well as experimental results are demonstrated. Theoretical data shows excellent correlation with experimental results.