Influence of solution acidity on composition, structure and electrical parameters of Ni-P alloys

Purpose - The purpose of this paper is to characterize electrical parameters of amorphous Ni-P resistive layers used for fabrication of precise resistors. Design/methodology/approach - Ni-P resistive layers were produced by the chemical process in water solution using Ni²⁺and H ₂PO₂^- ions. The paper presents the results of the studies concerning the influence of bath acidity and conditions of thermal stabilization on the structure and temperature coefficient of resistance of Ni-P alloy. Findings - The temperature coefficient of resistance of amorphous Ni-P layers was found to depend significantly on the parameters of chemical metallisation process. It was stated that the changes of through-casing resistivity versus the acidity of technological solution have roughly parabolic characteristics. Originality/value - In this paper, it was at first explained how the changes of the structure of Ni-P resistive layers depend on their temperature coefficient of capacitance. Alloys Electrical resistivity Metallizing Resistors Thin film ©