Electronic properties of the iron phthalocyanine thin films UHV annealed and exposed to oxygen

The electronic properties of the UHV annealed iron phthalocyanine (FePc) thin films exposed to oxygen have been studied using Photoemission Yield Spectroscopy (PYS). Depending on the annealing temperature as well as the oxygen exposure, the variations of the work function θ{symbol} were analyzed together with the effective density of the filled electronic states localized in the band gap below the Fermi level E_F and in the upper part of the valence band. The possible origin of these electronic states was briefly discussed.